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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - A next-generation EMF simulator for EUV lithography based on the pseudo-spectral time-domain method

Yeung, Michael S., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 241 KB

english, 2012

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Sub-atmospheric gas purification for EUVL vacuum environment control

Srivastava, Abneesh, Pereira, Stenio, Gaffney, Thomas, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 833 KB

english, 2012

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Progress in EUV lithography towards manufacturing from an exposure tool perspective

Hermans, Jan V., Laidler, David, Foubert, Philippe, D'havé, Koen, Cheng, Shaunee, Dusa, Mircea, Hendrickx, Eric, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.87 MB

english, 2012

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Front Matter: Volume 8322

SPIE, Proceedings of, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 257 KB

english, 2012

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Efficient multi-die placement for blank defect mitigation in EUV lithography

Du, Yuelin, Zhang, Hongbo, Wong, Martin D. F., Deng, Yunfei, Topaloglu, Rasit O., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 773 KB

english, 2012

6

Autotomy in decapod Crustacea

Florence Dowden Wood, Horace Elmer Wood II

Journal:

Journal of Experimental Zoology Part A Ecological Genetics and Physiology

Year:

1932

Language:

english

File:

PDF, 2.61 MB

english, 1932

7

Novel Processing to Produce Polymer/Ceramic Nanocomposites by Atomic Layer Deposition

Xinhua Liang, Luis F. Hakim, Guo-Dong Zhan, Jarod A. McCormick, Steven M. George, Alan W. Weimer, Joseph A. Spencer II, Karen J. Buechler, John Blackson, Charles J. Wood, John R. Dorgan

Journal:

Journal of the American Ceramic Society

Year:

2007

Language:

english

File:

PDF, 1.57 MB

english, 2007

8

A note on some tree similarity measures

Karel Culik II, Derick Wood

Journal:

Information Processing Letters

Year:

1982

Language:

english

File:

PDF, 448 KB

english, 1982

9

Reduced Presynaptic Dopamine Activity in Fibromyalgia Syndrome Demonstrated With Positron Emission Tomography: A Pilot Study

Patrick B. Wood, James C. Patterson II, John J. Sunderland, Kerrie H. Tainter, Michael F. Glabus, David L. Lilien

Journal:

The Journal of Pain

Year:

2007

Language:

english

File:

PDF, 2.70 MB

english, 2007

10

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

La Fontaine, Bruno, Pawloski, Adam R., Deng, Yunfei, Chovino, Christian, Dieu, Laurent, Wood II, Obert R., Levinson, Harry J., Mackay, R. Scott

Year:

2004

Language:

english

File:

PDF, 576 KB

english, 2004

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Particle contamination effects in EUVL: enhanced theory for the analytical determination of critical particle sizes

Brandstetter, Gerd, Govindjee, Sanjay, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 366 KB

english, 2012

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - High sensitivity chemically amplified EUV resists through enhanced EUV absorption

Ongayi, Owendi, Christianson, Matthew, Meyer, Matthew, Coley, Suzanne, Valeri, David, Kwok, Amy, Wagner, Mike, Cameron, Jim, Thackeray, Jim, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.71 MB

english, 2012

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Pattern collapse mitigation strategies for EUV lithography

Goldfarb, Dario L., Bruce, Robert L., Bucchignano, James J., Klaus, David P., Guillorn, Michael A., Wu, Chunghsi J., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 3.57 MB

english, 2012

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Analysis of EUV mask multilayer defect printing characteristics

Erdmann, Andreas, Evanschitzky, Peter, Bret, Tristan, Jonckheere, Rik, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 2.54 MB

english, 2012

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - In-situ Sn contamination removal by hydrogen plasma

Sporre, J., Elg, D., Andruczyk, D., Cho, T., Ruzic, D. N., Srivastava, S., Brandt, D. C., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.82 MB

english, 2012

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning

Ekinci, Yasin, Vockenhuber, Michaela, Terhalle, Bernd, Hojeij, Mohamad, Wang, Li, Younkin, Todd R., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 6.85 MB

english, 2012

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Liftoff lithography of metals for extreme ultraviolet lithography mask absorber layer patterning

Lyons, Adam, Teki, Ranganath, Hartley, John, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 6.91 MB

english, 2012

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Modeling and optimization of mass-limited targets for EUV lithography

Sizyuk, T., Hassanein, A., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.76 MB

english, 2012

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Development of practical flare correction tool for full chip in EUV lithography

Uno, Taiga, Mashita, Hiromitsu, Miyairi, Masahiro, Kotani, Toshiya, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 528 KB

english, 2012

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, Igor A., Zoethout, Erwin, Louis, Eric, Yakunin, Andrei M., Müllender, Stephan, Bijkerk, Fred, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 221 KB

english, 2012

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - High brightness electrodeless Z-Pinch EUV source for mask inspection tools

Horne, Stephen F., Partlow, Matthew J., Gustafson, Deborah S., Besen, Matthew M., Smith, Donald K., Blackborow, Paul A., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.01 MB

english, 2012

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Developing particle detection test bench for vacuum components

Khopkar, Yashdeep, Herbol, Henry, Upadhyaya, Mihir, Denbeaux, Gregory, Jindal, Vibhu, Kearney, Patrick, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 630 KB

english, 2012

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Smoothing of substrate pits using ion beam deposition for EUV lithography

Harris-Jones, Jenah, Jindal, Vibhu, Kearney, Patrick, Teki, Ranganath, John, Arun, Kwon, Hyuk Joo, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.54 MB

english, 2012

24

ChemInform Abstract: Electron-Transfer Reactions of Technetium and Rhenium Complexes. Part 2. Relative Self-Exchange Rate of the M(I)/M(II) Couples (M(DMPE)3)+/2+, Where M: Tc or Re and DMPE: 1,2-Bis(dimethylphosphino)ethane

LIBSON, K., WOODS, M., SULLIVAN, J. C., WATKINS, J. W. II, ELDER, R. C., DEUTSCH, E.

Journal:

Year:

1988

File:

PDF, 90 KB

1988

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Longer wavelength EUV lithography (LW-EUVL)

Maloney, Christopher W., Smith, Bruce W., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 505 KB

english, 2012

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

Andruczyk, Daniel, Sporre, John, Elg, Dan, Cho, Tae, Ruzic, David N., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.98 MB

english, 2012

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Latest cluster performance for EUV lithography

Shite, H., Matsunaga, K., Nafus, K., Kosugi, H., Foubert, P., Hermans, J., Hendrickx, E., Goethals, M., Van Den Heuvel, D., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 3.63 MB

english, 2012

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Study on CD variation in the vicinity of the exposure field edge in EUV lithography

Lim, Chang-Moon, Kim, Seokkyun, Park, Jun-Taek, Hyun, Yoonsuk, Lee, Jong-Su, Koo, Sunyoung, Kim, Myoungsoo, Kang, Hyosang, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 2.10 MB

english, 2012

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - 3D mask modeling for EUV lithography

Mailfert, Julien, Zuniga, Christian, Philipsen, Vicky, Adam, Konstantinos, Lam, Michael, Word, James, Hendrickx, Eric, Vandenberghe, Geert, Smith, Bruce, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 2.68 MB

english, 2012

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Analysis and control of thermal and structural deformation of projection optics for 22-nm EUV lithography

Yang, Guanghua, Li, Yanqiu, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 563 KB

english, 2012

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Modeling the ion beam target interaction to reduce defects generated by ion beam deposition

Cardinal, Thomas, Andruczyk, Daniel, Yu, He, Jindal, Vibhu, Kearney, Patrick, Ruzic, David N., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 268 KB

english, 2012

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - 50X, 75X mask cleaning effects on EUV lithography process and lifetime: lines and spaces, contacts, and LER

McClinton, Brittany M., Chen, Robert J., George, Simi A., Kim, Yongbae, Baclea-an, Lorie-Mae, Naulleau, Patrick P., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 2.62 MB

english, 2012

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Modeling and simulation of acid diffusion in chemically amplified resists with polymer-bound acid generator

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 509 KB

english, 2012

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Aerial image monitor for wavefront metrology of high-resolution EUV lithography tools

Miyakawa, Ryan, Naulleau, Patrick, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 628 KB

english, 2012

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask

Murachi, Tetsunori, Amano, Tsuyoshi, Oh, Sung Hyun, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.58 MB

english, 2012

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Extension of PTB's EUV metrology facilities

Laubis, Christian, Fischer, Andreas, Scholze, Frank, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 39.25 MB

english, 2012

37

Governors Turn Pro: Separation of Powers and the Institutionalization of the American Governorship

Ann O'M. Bowman, Neal D. Woods and Milton R. Stark II

Journal:

Political Research Quarterly

Year:

2010

Language:

english

File:

PDF, 2.00 MB

english, 2010

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Ban, Keundo, Naulleau, Patrick P., Wood II, Obert R., Heo, Junggun, Shim, Hyunkyung, Park, Minkyung, Lee, Kilyoung, Koo, Sunyoung, Kim, Jaeheon, Bok, Cheolkyu, Kim, Myoungsoo, Kang, Hyosang

Year:

2012

Language:

english

File:

PDF, 3.28 MB

english, 2012

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Model calibration and slit position effect on full-mask process and proximity correction for extreme ultraviolet lithography

Huang, Hsu-Ting, Naulleau, Patrick P., Wood II, Obert R., Dai, Huixiong, Mokhberi, Ali, Xu, Xumou, Liu, Anwei, Ngai, Chris

Year:

2012

Language:

english

File:

PDF, 3.06 MB

english, 2012

40

Symposium: “St. Claire Drake: The Making of a Scholar-Activist” || ALMOST “NO NEGRO VETERAN … COULD GET A LOAN”: AFRICAN AMERICANS, THE GI BILL, AND THE NAACP CAMPAIGN AGAINST RESIDENTIAL SEGREGATION, 1917–1960

Louis Lee Woods II

Journal:

The Journal of African American History

Year:

2013

Language:

english

File:

PDF, 177 KB

english, 2013

41

Systolic tree acceptors

Culik, Karel Ii, Salomaa, Arto, Wood, Derick

Journal:

RAIRO. Informatique théorique

Year:

1984

Language:

english

File:

PDF, 1.39 MB

english, 1984

42

Circadian organization of thymidylate synthase activity in normal tissues: A possible basis for 5-fluorouracil chronotherapeutic advantage

David W. Lincoln II, William J.M. Hrushesky, Patricia A. Wood

Journal:

International Journal of Cancer

Year:

2000

Language:

english

File:

PDF, 132 KB

english, 2000

43

Refutation of the alleged diametric growth of erupted rat molars

Horace Elmer Wood II, Florence Dowden Wood

Journal:

The Anatomical Record Advances in Integrative Anatomy and Evolutionary Biology

Year:

1931

Language:

english

File:

PDF, 777 KB

english, 1931

44

Immune system of the spontaneously hypertensive rat: II. Morphology and function

Edwin S. Purcell, Gary W. Wood, Vincent H. Gattone II

Journal:

The Anatomical Record Advances in Integrative Anatomy and Evolutionary Biology

Year:

1993

Language:

english

File:

PDF, 902 KB

english, 1993

45

Co2 laser in vitreoretinal surgery

David B. Karlin, C. K. N. Patel, O. R. Wood II, Irene Llovera

Journal:

Lasers in Surgery and Medicine

Year:

1980

Language:

english

File:

PDF, 584 KB

english, 1980

46

Occurrence and fragmentation of high-mass fullerenes

Dor Ben-Amotz, R. Graham Cooks, Lindy Dejarme, Jason C. Gunderson, Steven H. Hoke II, Bart Kahr, Gregory L. Payne, Joe M. Wood

Journal:

Chemical Physics Letters

Year:

1991

Language:

english

File:

PDF, 323 KB

english, 1991

47

Laser action in CdS by optical pumping with radiation from a CO2 laser-produced plasma

S.C. Matts, W.T. Silfvast, O.R. Wood II

Journal:

Optics Communications

Year:

1976

Language:

english

File:

PDF, 312 KB

english, 1976

48

Continuous tuning of a single laser mode over 5 cm-1 in a high-pressure N2O/CO2 transfer laser

T.Y. Chang, J.D. McGee, O.R. Wood II

Journal:

Optics Communications

Year:

1976

Language:

english

File:

PDF, 299 KB

english, 1976

49

High resolution spectroscopy using an optically pumped high-pressure N2O/CO2 transfer laser

T.Y. Chang, J.D. McGee, O.R. Wood II

Journal:

Optics Communications

Year:

1976

Language:

english

File:

PDF, 70 KB

english, 1976

50

A high power transversely excited CO2 waveguide laser

O.R. Wood II, P.W. Smith, P.J. Maloney, C.R. Adams

Journal:

Optics Communications

Year:

1980

Language:

english

File:

PDF, 247 KB

english, 1980

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